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A Genesis cryopump system consists of two main components: the pump module and the compressor module. Each module is connected together by flexible helium hoses that form a closed loop system. Two types of Genesis ICP cryopumps are available; The Standard ICP cryopump features a pump body, refrigerator, relief-valve and a second stage temperature sensor. The Quick Regeneration ICP cryopump features a Standard pump outfitted with dual temperature sensors, integrated heaters, integrated roughing and purge valves, pirani gauge, and a communications interface. Upright ICP cryopumps consist of a body/flange orientation that is mounted directly in-line with the cryopump centerline. Low-Profile (LP) ICP cryopumps consist of a body/flange orientation that is mounted 90 degrees from the centerline of the pump. The refrigerator motor casing has three orientation options, in-line, right and left. High Vacuum (HV) ICP cryopumps utilize a baffle at the inlet of the pump. HV cryopumps can be configured as an upright or low-profile pump. |
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The HV pump is considered "valve-less" and as a result offers maximum performance. HV pumps are widely used where high water vapor and high hydrogen pumping speeds are required. HV pumps also have high impulse crossover capability and can handle high throughputs. Due to these characteristics HV pumps have become the preferred pumps in most applications, for instance in sputtering and ion implantation. |
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| Cryopumps are also
used in semiconductor device processing applications such as system out-gassing
stations. In the scientific research community cryopumps are used in beam
lines, target chambers for particle accelerators, and for general high vacuum
applications including space simulation chambers. Fixed-Sputter (FS) ICP cryopumps utilize a throttling plate at
the inlet of the pump. FS cryopumps can be configured as an upright or
low-profile pump. The term Fixed Sputtering (FS) refers to any ICP cryopump
fitted with a fixed orifice plate on the inlet of the cryopump. The pumping
speed delivered to the chamber is throttled to a specific speed by the
sized orifice plate. Sputtering pumps are able to handle high throughput loads while maintaining
low and stable temperatures of the first and second stage arrays. By keeping
temperatures low and stable, the water vapor, hydrogen and helium pumping
speeds will remain high. Sputtering pumps also accumulate large amounts
of process gas. ICP 200 and 300/300L cryopumps are standardized with a
30 liter hydrogen array. Ultra High Vacuum (UHV) Ultra High Vacuum refers to an ICP cryopump fitted with a con-flat (metal sealed) main flange. UHV pumps meet a minimum of 2 x 10 -10 torr vacuum levels. UHV pumps can be configured as a fixed sputtering or high vacuum cryopump and are available in Standard and Quick Regeneration configurations. |
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Cryopump Components The pump module consists of four major components: the refrigerator (expander), the first stage array (includes the baffle or sputtering/orifice plate), the second stage array (charcoal array) and the pump body/main flange. The expander in the pump module produces refrigeration power to cool the pump arrays to cryogenic temperatures. The first and second stage arrays provide pumping surfaces on which gases from the vacuum chamber are condensed or adsorbed. This type of pump is also known as a capture pump. |
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The refrigerator operates on the Gifford-McMahon cycle that utilizes high-pressure gas (helium) from the compressor and expands it in two stages to produce cryogenic temperatures at the pump arrays. The actual temperatures produced depend on the thermal and gas loads imposed and the pump configuration that is paired up with a compressor. The normal temperature range for the first stage is 40 to 70 degrees Kelvin and 11 to 20 degrees Kelvin for the second stage. The refrigerator consists of an actuator and a two-stage displacer operated by an electric stepper motor. 99.999% purity helium is the working gas in the system. The cryo-arrays are mechanically attached to the cold head and cooled by the refrigeration power of the expander. The cryo-arrays pump gases in two ways: by cryosorption and by cryocondensation. The first stage pumps most of the easily condensed gas, such as water vapor, and thermally shields the second stage. The second stage pumps all other gases, such as argon, nitrogen, hydrogen, neon and helium. All ICP cryopumps are equipped with a pressure
relief valve. The pressure relief valve is designed to open
at a pressure of 2.7 - 3.0 psi, and contains a standard NW-40 vacuum connection
flange for isolating gas removal from the cryopump. Cryopump temperature sensors are self contained Family 10 silicon diodes. Standard cryopumps have one sensor attached to the second stage array. Quick Regeneration pumps have one sensor attached to the second stage array and one attached to the first stage array. The cryopump temperature for all standard pumps can be read from a Family 10 monitoring device. GVT carries both single and multi-channel Family 10 monitoring devices. ICP Quick Regeneration pumps feature heaters for quicker warm-up times during pump regeneration. Heaters are also used to maintain the first and second stage temperatures of the pump to a specified set-point. ICP Quick Regeneration pumps have an integrated purge valve for regeneration of the cryopump. The valve features a ¼" male VCR fitting to which a dry nitrogen line can be attached. The recommended pressure of the nitrogen line is 25 to 60 psi. The minimum recommended flow rate is 2 scfm. Quick Regeneration pumps have an integrated roughing valve for regeneration
of the cryopump. The valve is pneumatically actuated and requires an air-line
pressurized to 60 psi. The air-line actuator requires a 1/8" NPT
to ¼" (OD) universal brass compression tube fitting for the
air-line connection. The roughing valve connects to the roughing system
through a standard NW-25 connection. |
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© 2002 Genesis Vacuum Technologies,
Inc.
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